A recent study by MIT’s Project NANDA highlighted a sobering statistic: Roughly 95% of AI projects fail to deliver ...

Cloud bills rising? Here's how AI-powered rightsizing, predictive autoscaling and real-time anomaly detection can lower spend ...

Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

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Process design kits consist of a set of files that typically contain descriptions of the basic building blocks of the process. They are expressed, algorithmically, as Pcells. These descriptions are ...