LONDON — U.S. chipmakers are using software from Applied Materials Inc. to check changes made by EDA vendors' optical proximity correction software for 65-nanometer manufacturing process development, ...

Some chip makers have been getting a boost from implementing optical proximity correction across the lithography process window at the 65- and even 90-nanometer nodes, but the practice will become ...

Experts at the Table: Semiconductor Engineering sat down to discuss optical and EUV photomasks issues, as well as the challenges facing the mask business, with Naoya Hayashi, research fellow at DNP; ...

Turnaround time (TAT) for photomask makers has historically increased at smaller and smaller process nodes, as reported in the eBeam Initiative Mask Makers surveys, so it’s important to look at the ...